JPH0551892B2 - - Google Patents

Info

Publication number
JPH0551892B2
JPH0551892B2 JP62260939A JP26093987A JPH0551892B2 JP H0551892 B2 JPH0551892 B2 JP H0551892B2 JP 62260939 A JP62260939 A JP 62260939A JP 26093987 A JP26093987 A JP 26093987A JP H0551892 B2 JPH0551892 B2 JP H0551892B2
Authority
JP
Japan
Prior art keywords
film
cross
photoresist
photomask
light shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62260939A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01102464A (ja
Inventor
Toshimitsu Kamitaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP62260939A priority Critical patent/JPH01102464A/ja
Publication of JPH01102464A publication Critical patent/JPH01102464A/ja
Publication of JPH0551892B2 publication Critical patent/JPH0551892B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP62260939A 1987-10-15 1987-10-15 フォトマスク Granted JPH01102464A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62260939A JPH01102464A (ja) 1987-10-15 1987-10-15 フォトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62260939A JPH01102464A (ja) 1987-10-15 1987-10-15 フォトマスク

Publications (2)

Publication Number Publication Date
JPH01102464A JPH01102464A (ja) 1989-04-20
JPH0551892B2 true JPH0551892B2 (en]) 1993-08-03

Family

ID=17354875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62260939A Granted JPH01102464A (ja) 1987-10-15 1987-10-15 フォトマスク

Country Status (1)

Country Link
JP (1) JPH01102464A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0592295U (ja) * 1992-05-15 1993-12-17 淑朗 矢田貝 荷役用フォークレット及びフォークリフトの爪

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100347541B1 (ko) * 1999-12-23 2002-08-07 주식회사 하이닉스반도체 반도체 소자 제조용 레티클

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5379387A (en) * 1976-12-23 1978-07-13 Nec Corp Optical mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0592295U (ja) * 1992-05-15 1993-12-17 淑朗 矢田貝 荷役用フォークレット及びフォークリフトの爪

Also Published As

Publication number Publication date
JPH01102464A (ja) 1989-04-20

Similar Documents

Publication Publication Date Title
JP3507771B2 (ja) パターン形成方法及び薄膜トランジスタの製造方法
US5922516A (en) Bi-layer silylation process
KR0170899B1 (ko) 반도체소자의 콘택홀 제조방법
JPH0551892B2 (en])
JPH07105375B2 (ja) 細い導体デバイスの製造方法
JPS63186477A (ja) 半導体装置の製造方法
JPS6214095B2 (en])
KR100466026B1 (ko) 고집적 반도체 소자의 도전체 패턴 제조 방법
KR20030092569A (ko) 반도체 소자의 제조 방법
KR0159012B1 (ko) 2층 감광막 패턴 형성방법
KR0134109B1 (ko) 반도체소자의 콘택홀 제조방법
KR960008559B1 (ko) 반도체 소자의 미세 콘택홀 형성방법
JPS63313866A (ja) 半導体装置の製造方法
JP3010706B2 (ja) 半導体装置の製造方法
KR100235936B1 (ko) 레지스트 패턴형성방법
KR100289664B1 (ko) 노광 마스크의 제조방법
JPH0327521A (ja) Ｍｏｓ型トランジスタの製造方法
KR0172300B1 (ko) 미세 선폭을 갖는 전도막 형성방법
JP3330673B2 (ja) 半導体装置及びその製造方法
KR100252892B1 (ko) 반도체소자의 배선 형성방법
KR100382548B1 (ko) 반도체 소자의 제조방법
KR950009293B1 (ko) 식각선택비가 향상된 단층레지스트 패턴 형성방법
JPH0653107A (ja) 半導体装置の製造方法
KR20010047660A (ko) 커패시터 제조방법
JPH02226724A (ja) 集積回路装置の製造方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees